Diffusion Bonding Crystal is a sort of item that integrates laser Crystal with pure homogeneous substratum product by thermal Diffusion Bonding innovation. The Bonding product can properly minimize the thermal lensing impact of laser Crystal under the condition of high power pumping.

Crystal bonding describes the interactions of atoms, ions, or molecules that comprise a crystal. Essentially, it relies on the Coulomb communication in between particles, yet it can be divided right into van der Waals force (or van der Waals force), ionic bond, covalent bond, metallic bond and hydrogen bond in regards to its symptom.

Crystal bonding innovation is the homogeneous or heterogeneous crystal products, crystal preparation (that is, surface handling), cleansing, activation treatment, without using any type of bonding material, under particular conditions straight suit one, crystal with van der Waals pressure, molecular pressure, also atomic pressure with each other.

Crystal bonding modern technology plays an important role in the research of brand-new optical gadgets and brand-new solid-state lasers.

Bonding Crystal
Bonding Crystal

Bond process

Bonding: electrostatic bonding, warm bonding, “composite” bonding. The objective of bonding is to “bond” numerous substrates by outside action. Various bonding modes, various bonding concepts

1.Electrostatic bonding: Recommended by Wallis as well as Pomerantz in 1969, electrostatic bonding is a method of bonding glass with steels, alloys or semiconductors without any binder


  • Borosilicate glass as well as phosphosilicate glass soften at a specific temperature level as well as behave like electrolytes. Under the applied voltage, the positive ion (Na) drifts in the direction of the cathode and also forms an area fee region at the anode. The drift stops when the used voltage falls on the area cost area
  • As an example, silicon attaches the anode, glass attaches the cathode, silicon and glass contact, and the negative space cost region created at the interface responds with silicon, forming the chemical bond Si-o-Si, as well as finishing the bond
  • spots the completion of the bond by detecting the present

2.Hot bonding: after heat treatment, the silicon wafers are directly bonded together. Lasky proposed

  • Direct Silicon bonding (SDB).
  • Silicon Combination bonding (SFB).
  • Straight sample bonding (DWB).

3.”Compound” bonding.

Bonding is accomplished by the response in between the intermediate layers.

  • Bond with silicide: NiSi, PtSi, TiSi2, etc – Capitalizing on the reduced common melting point (around 400 levels) of silicon and gold.
  • Amorphous silicon.

Advantages of bound crystals.

  • lowers thermal lensing impacts caused by end surface area deformation.
  • improves light-to-light conversion efficiency.
  • increases the damages resistance limit.
  • enhances the outcome light beam top quality of the laser.
  • Diminishes the volume.

crylink utilizes surface activated bonding technology, which is a low temperature level or area temperature level bonding innovation, normally defined by surface area cleaning and surface activation. By impacting the bonding surface area with fast atomic or ion beams, the bonding stamina can be properly improved before bonding, so that high-quality bonding can be achieved between inorganic products, metals, and semiconductor products.

Surface area activated bonding modern technology has higher bonding pressure interface than thermal temperature bonding. It has much better control over light absorption loss and surface area morphological changes, while the external contamination of thermal diffusion bonding cannot be removed.Surface area turned on bonding technology has the advantages of eliminating residual elements of polishing, eliminating organic toxins, eliminating surface oxide layer, breaking chemical bonds of materials, and also improving activation energy.

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